Kato, Kimihiko https://orcid.org/0000-0002-7117-0838
Liu, Yongxun https://orcid.org/0000-0002-3321-2830
Murakami, Shigenori
Morita, Yukinori https://orcid.org/0000-0002-2666-6762
Mori, Takahiro https://orcid.org/0000-0001-5899-1060
Funding for this research was provided by:
Core Research for Evolutional Science and Technology (Grant No. JPMJCR1871)
Ministry of Education, Culture, Sports, Science and Technology (Quantum Leap Flagship Program (Q-LEAP) Grant No. J)
Japan Society for the Promotion of Science (KAKENHI Grant-in-Aid for Early-Career Scientists G)
Article Title: Electron beam lithography with negative tone resist for highly integrated silicon quantum bits
Journal Title: Nanotechnology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd
Publication dates
Date Received: 2021-06-23
Date Accepted: 2021-08-23
Online publication date: 2021-09-07