You, Young Gyu
Shin, Dong Ho
Ryu, Jong Hwa
Campbell, E E B https://orcid.org/0000-0002-4656-3218
Chung, Hyun-Jong https://orcid.org/0000-0002-8840-6296
Jhang, Sung Ho https://orcid.org/0000-0002-8371-5532
Article Title: Atomic layer deposited Al2O3 passivation layer for few-layer WS2 field effect transistors
Journal Title: Nanotechnology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd
Publication dates
Date Received: 2021-07-17
Date Accepted: 2021-09-03
Online publication date: 2021-09-21