Yoo, Seong Jae https://orcid.org/0000-0003-3700-6476
Kang, Ji Eun
Ji, You Jin
Tak, Hyun Woo
Cho, Byeong Ok
Kim, Young Lae
Lee, Ki Chan
Chun, Jin Sung
Kim, Yongil
Kim, Dong Woo
Yeom, Geun Young https://orcid.org/0000-0002-1176-7448
Funding for this research was provided by:
Ministry of Trade, Industry and Energy
Article Title: Highly selective etching of SiNx over SiO2 using ClF3/Cl2 remote plasma
Journal Title: Nanotechnology
Article Type: paper
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Publication dates
Date Received: 2023-03-12
Date Accepted: 2023-08-02
Online publication date: 2023-08-29