Cui, Xuewen
Zhang, Siliang
Cong, Xue
Gao, Jiaxing
Wu, Yurui
Guo, Xudong
Hu, Rui
Wang, Shuangqing https://orcid.org/0000-0002-8281-9399
Chen, Jinping
Li, Yi
Du, Wenna https://orcid.org/0000-0003-0023-0183
Yang, Guoqiang
Funding for this research was provided by:
National Natural Science Foundation of China (22073108)
Youth Innovation Promotion Association of the Chinese Academy of Sciences (2020035)
Article Title: A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
Journal Title: Nanotechnology
Article Type: paper
Copyright Information: © 2024 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-01-25
Date Accepted: 2024-04-09
Online publication date: 2024-04-30