Kim, Ho Jun
Lee, Hae June
Journal title: Plasma Sources Science and Technology
Article type: paper
Article title: Analysis of intermediate pressure SiH4/He capacitively coupled plasma for deposition of an amorphous hydrogenated silicon film in consideration of thermal diffusion effects
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2016-11-29
Date accepted: 2017-06-12
Online publication date: 2017-07-17