Wang, J-C
Tian, W
Rauf, S https://orcid.org/0000-0001-5689-6115
Sadighi, S
Kenney, J
Stout, P
Vidyarthi, V S
Guo, J
Zhou, T
Delfin, K
Lundy, N
Pandey, S C https://orcid.org/0000-0002-2629-0822
Guo, S
Sandhu, G S
Journal title: Plasma Sources Science and Technology
Article type: paper
Article title: A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas
Copyright information: © 2018 IOP Publishing Ltd
Publication dates
Date received: 2018-04-03
Date accepted: 2018-08-20
Online publication date: 2018-09-14