Qiu, Jie https://orcid.org/0000-0003-1066-6140
Li, Jiang-Tao https://orcid.org/0000-0001-7101-0845
Chen, Wen-Cong
Wang, Zhen-Bin
Liu, Fei-Xiang https://orcid.org/0000-0001-8765-1188
Pu, Yi-Kang https://orcid.org/0000-0002-9319-4291
Funding for this research was provided by:
National Natural Science Foundation of China (11675089, 91641204)
National Key Research and Development Program of China (2016YFB0600602)
Journal title: Plasma Sources Science and Technology
Article type: paper
Article title: Temporal evolution of a capacitively coupled argon discharge due to the sputtering of an oxide layer on an aluminum electrode
Copyright information: © 2019 IOP Publishing Ltd
Publication dates
Date received: 2019-02-22
Date accepted: 2019-05-13
Online publication date: 2019-06-24