Lee, Moo-Young
Jung, Jiwon
Kim, Tae-Woo
Kim, Kyung-Hyun
Chung, Chin-Wook https://orcid.org/0000-0002-7771-6547
Funding for this research was provided by:
National Research Foundation of Korea (NRF-2019M1A7A1A03087579)
Ministry of Trade, Industry and Energy (10052861 20007145)
Article Title: A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring
Journal Title: Plasma Sources Science and Technology
Article Type: paper
Copyright Information: © 2020 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-05-16
Date Accepted: 2020-06-10
Online publication date: 2020-07-22