Zhang, Aixian
Lee, Moo-Young
Lee, Ho-Won
Moon, Ho-Jun
Chung, Chin-Wook https://orcid.org/0000-0002-7771-6547
Funding for this research was provided by:
Small and Medium Business Administration (20009415 20011226 20007145 20010412)
National Research Foundation of Korea (NRF-2019M1A7A1A03087579)
Article Title: Effects of RF bias frequency and power on the plasma parameters and ash rate in a remote plasma source
Journal Title: Plasma Sources Science and Technology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd
Publication dates
Date Received: 2020-09-16
Date Accepted: 2021-01-12
Online publication date: 2021-03-01