Arts, Karsten https://orcid.org/0000-0003-4266-6559
Hamaguchi, Satoshi https://orcid.org/0000-0001-6580-8797
Ito, Tomoko https://orcid.org/0000-0002-3482-4046
Karahashi, Kazuhiro https://orcid.org/0000-0001-9951-6573
Knoops, Harm C M https://orcid.org/0000-0003-2284-4477
Mackus, Adriaan J M https://orcid.org/0000-0001-6944-9867
(Erwin) Kessels, Wilhelmus M M https://orcid.org/0000-0002-7630-8226
Article Title: Foundations of atomic-level plasma processing in nanoelectronics
Journal Title: Plasma Sources Science and Technology
Article Type: paper
Copyright Information: © 2022 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2022-08-30
Date Accepted: 2022-09-28
Online publication date: 2022-10-25