He, You
Jiang, Yi-Lang https://orcid.org/0000-0002-6611-4743
Jung, Jiwon
Kim, Min-Seok
Kim, Ju-Ho https://orcid.org/0000-0001-9012-8275
Chung, Chin-Wook https://orcid.org/0000-0002-7771-6547
Funding for this research was provided by:
Ministry of Trade, Industry and Energy (20009415)
National Research Foundation of Korea (NRF-2019M1A7A1A03087579)
Article Title: Improvement of photoresist etching by impedance control of a bias electrode in an inductive discharge
Journal Title: Plasma Sources Science and Technology
Article Type: paper
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Publication dates
Date Received: 2023-05-11
Date Accepted: 2023-06-27
Online publication date: 2023-07-17