Chen, Fei
Cao, Jin-Wen https://orcid.org/0000-0002-1453-5714
Sun, Su-Rong https://orcid.org/0000-0002-0317-4028
Wang, Hai-Xing https://orcid.org/0000-0001-7426-0946
Murphy, Anthony B https://orcid.org/0000-0002-2820-2304
Funding for this research was provided by:
National Natural Science Foundation of China (12375245, 12175011, 12535016)
Strategic Priority Research Program of the Chinese Academy of Sciences (XDA 0380603, 0380604)
Fundamental Research Funds for the Central Universities (YWF-23-L-1221)
Article Title: Transport and diffusion properties of tin–hydrogen plasmas in extreme ultraviolet lithography reactor
Journal Title: Plasma Sources Science and Technology
Article Type: paper
Copyright Information: © 2025 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2025-04-05
Date Accepted: 2025-09-12
Online publication date: 2025-09-25