Beckmann, K
Holt, J
Olin-Ammentorp, W
Alamgir, Z
Van Nostrand, J
Cady, N C
Funding for this research was provided by:
Air Force Research Laboratory (FA8750-16-1-0063)
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: The effect of reactive ion etch (RIE) process conditions on ReRAM device performance
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2017-03-15
Date accepted: 2017-07-10
Online publication date: 2017-08-24