Hartmann, J M
Veillerot, M
Prévitali, B
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: A benchmark of co-flow and cyclic deposition/etch approaches for the selective epitaxial growth of tensile-strained Si:P
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2017-05-05
Date accepted: 2017-07-28
Online publication date: 2017-08-31