Zhu, H P https://orcid.org/0000-0003-1307-3631
Zheng, Z S
Li, B
Li, B H
Zhang, G P
Li, D L
Gao, J T
Yang, L
Cui, Y
Liang, C P
Luo, J J
Han, Z S
Funding for this research was provided by:
U. S. Department of Energy (DE-FG02-06ER46304)
National Key Research and Development Program of China (2016YFB0901801, 2016YFB0901804)
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: Total dose effect of Al2O3-based metal–oxide–semiconductor structures and its mechanism under gamma-ray irradiation
Copyright information: © 2018 IOP Publishing Ltd
Publication dates
Date received: 2018-07-03
Date accepted: 2018-08-15
Online publication date: 2018-10-11