Hartmann, J M https://orcid.org/0000-0001-7006-8586
Veillerot, M
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: HCl + GeH4 etching for the low temperature cyclic deposition/etch of Si, Si:P, tensile-Si:P and SiGe(:B)
Copyright information: © 2019 IOP Publishing Ltd
Publication dates
Date received: 2019-07-15
Date accepted: 2019-10-30
Online publication date: 2019-12-02