Hartmann, J M https://orcid.org/0000-0001-7006-8586
Veillerot, M
Article Title: HCl + GeH 4 etching for the low temperature cyclic deposition/etch of Si, Si:P, tensile-Si:P and SiGe(:B)
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2019 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-07-15
Date Accepted: 2019-10-30
Online publication date: 2019-12-02