Mauersberger, Tom https://orcid.org/0000-0001-8775-4283
Trommer, Jens
Sharma, Saurabh
Knaut, Martin
Pohl, Darius
Rellinghaus, Bernd
Mikolajick, Thomas https://orcid.org/0000-0003-3814-0378
Heinzig, André
Funding for this research was provided by:
Horizon 2020 Framework Programme (101016776)
Center for Advancing Electronics Dresden
European Social Fund (100382146)
Article Title: Single-step reactive ion etching process for device integration of hafnium-zirconium-oxide (HZO)/titanium nitride (TiN) stacks
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2021 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2021-05-25
Date Accepted: 2021-07-27
Online publication date: 2021-08-11