Ahmad, Habib https://orcid.org/0000-0002-3681-7245
Engel, Zachary
Zia, Muneeb
Weidenbach, Alex S
Matthews, Christopher M https://orcid.org/0000-0001-9833-4006
Zivasatienraj, Bill
Bakir, Muhannad S
Doolittle, W Alan
Funding for this research was provided by:
Air Force Office of Scientific Research (FA9550-21-1-0318)
Office of Naval Research (N00014-17-S-F006)
Article Title: Cascaded Ni hard mask to create chlorine-based ICP dry etched deep mesas for high-power devices
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-09-08
Date Accepted: 2021-10-26
Online publication date: 2021-11-12