Li, Ze https://orcid.org/0009-0003-2021-7717
Yuan, Guo-Dong
Zhang, Di https://orcid.org/0000-0002-1094-8925
Liu, Yu-Meng
Long, Hao-Ran
He, Li
Wang, De-Chen
Wei, Zhong-Ming https://orcid.org/0000-0002-6237-0993
Luo, Jun-Wei
Funding for this research was provided by:
National Natural Science Foundation of China (62175231)
National Natural Science Foundation of China (12374076)
Article Title: Effect of high temperature annealing on cryogenic transport properties of silicon MOSFETs with a thin SiO2/HfO2 stacked dielectric
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2023 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-06-07
Date Accepted: 2023-08-25
Online publication date: 2023-09-14