Liu, An-Chen https://orcid.org/0009-0003-7706-3659
Huang, Yu-Wen
Chen, Hsin-Chu https://orcid.org/0009-0003-4698-4842
Dong, Yi-Jun
Tu, Po-Tsung
Hsu, Lung-Hsing
Lai, Yung-Yu
Yeh, Po-Chun
Huang, I-Yu
Kuo, Hao-Chung https://orcid.org/0000-0002-9373-4649
Funding for this research was provided by:
National Science and Technology Council (NSTC), Taiwan (112-2222-E-110-008-)
National Science and Technology Council (NSTC), Taiwan (111-2218-E-008-005-)
Article Title: Investigating the effect of O2 plasma treatment on the operational characteristics of Schottky-gate AlGaN/GaN HEMT
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2024 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2023-10-17
Date Accepted: 2024-06-05
Online publication date: 2024-06-27