Liu, Yunfei https://orcid.org/0009-0004-6106-4128
Wang, Dechen
Song, Luhang
Li, Jiankun
Pei, Tian
Luo, Junwei
Yuan, Guodong https://orcid.org/0000-0001-9627-0934
Funding for this research was provided by:
National Key Research and Development Program of China (Project No. 2024YFA1408200)
National Natural Science Foundation of China (No.12374076)
Article Title: Suppression of charges within an Al2O3 high-κ dielectric and reduction of interface traps at the cryogenic temperature of a Ge n-MOS capacitor fabricated by plasma postoxidation and forming gas annealing
Journal Title: Semiconductor Science and Technology
Article Type: paper
Copyright Information: © 2025 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2025-07-03
Date Accepted: 2025-09-09
Online publication date: 2025-09-25