Zhu, Jie-Jie https://orcid.org/0000-0002-5436-2221
Ma, Xiao-Hua
Hou, Bin
Chen, Li-Xiang
Zhu, Qing
Hao, Yue
Funding for this research was provided by:
the National Key Basic Research Program of China (2011CBA00606)
National Natural Science Foundation of China (61334002)
Journal title: Materials Research Express
Article type: paper
Article title: Comparative study on nitridation and oxidation plasma interface treatment for AlGaN/GaN MIS-HEMTs with AlN gate dielectric
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2016-08-03
Date accepted: 2016-11-08
Online publication date: 2017-02-13