Thriveni, G
Ghosh, Kaustab https://orcid.org/0000-0002-1517-2986
Funding for this research was provided by:
Department of Science and Technology (DST), Government of India (SERB/F/4573/2016-17)
Journal title: Materials Research Express
Article type: paper
Article title: Performance analysis of nanoscale double gate strained silicon MOSFET with high k dielectric layers
Copyright information: © 2019 IOP Publishing Ltd
Publication dates
Date received: 2019-04-13
Date accepted: 2019-05-07
Online publication date: 2019-05-24