Xie, Lin-Yan
Xiao, Dong-Qi
Pei, Jun-Xiang
Huo, Jingyong
Wu, Xiaohan
Liu, Wen-Jun
Ding, Shi-Jin https://orcid.org/0000-0002-5766-089X
Funding for this research was provided by:
National Natural Science Foundation of China (61874029)
Article Title: Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
Journal Title: Materials Research Express
Article Type: paper
Copyright Information: © 2020 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2020-01-31
Date Accepted: 2020-03-24
Online publication date: 2020-04-06