Li, Hui https://orcid.org/0009-0006-6920-6957
Cai, Xinchen
Zhang, Saiqian
Wang, Yeliang
Lv, Guangquan
Article Title: Controlling particle contamination during PECVD low-k film processing by optimizing inter- chamber pressure difference
Journal Title: Materials Research Express
Article Type: paper
Copyright Information: © 2025 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2025-07-29
Date Accepted: 2025-11-12
Online publication date: 2025-11-19