Funding for this research was provided by:
National Research Council of Science and Technology (1711121944 (CRC-20-01-NFRI))
Article Title: Analysis of optical emission spectroscopy data during silicon etching in SF6/O2/Ar plasma
Journal Title: Plasma Science and Technology
Article Type: paper
Copyright Information: © 2021 Hefei Institutes of Physical Science, Chinese Academy of Sciences and IOP Publishing
Publication dates
Date Received: 2021-05-14
Date Accepted: 2021-09-08
Online publication date: 2021-10-12