Funding for this research was provided by:
Japan Society for the Promotion of Science (21760033)
Article Title: Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
Journal Title: Journal of Physics Communications
Article Type: paper
Copyright Information: © 2020 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2020-05-23
Date Accepted: 2020-09-02
Online publication date: 2020-09-11