Zhao, Jun https://orcid.org/0000-0002-7692-1178
Yang, Shumin https://orcid.org/0000-0003-3297-8444
Xue, Chaofan
Wang, Liansheng
Liang, Zhaofeng https://orcid.org/0000-0003-4597-1487
Zhang, Lei
Wang, Yong
Wu, Yanqing https://orcid.org/0000-0001-7684-892X
Tai, Renzhong
Funding for this research was provided by:
the National Key Basic Research Program of China Science and Technology Commission of Shanghai Municipality (17JC1400802)
the National Key R&D Program of China (2017YFA0206001)
the National Natural Science Foundation of China (11775291)
Article Title: The recent development of soft x-ray interference lithography in SSRF
Journal Title: International Journal of Extreme Manufacturing
Article Type: paper
Copyright Information: © 2020 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT
Publication dates
Date Received: 2019-12-03
Date Accepted: 2020-01-21
Online publication date: 2020-02-26