Wang, Xianglin
Luo, Xinyu https://orcid.org/0009-0005-6788-1193
Du, Weiwei
Shen, Yuanhao
Huang, Xiaocheng
Yang, Zheng
Zhao, Junjie https://orcid.org/0000-0001-6205-9671
Funding for this research was provided by:
National Natural Science Foundation of China (21938011)
Fundamental Research Funds for the Central Universities (226-2024-00023)
Natural Science Foundation of Zhejiang Province (LR21B060003)
Science & Technology Department of Zhejiang Province (2023C01182)
Shanxi Institute of Zhejiang University for New Materials and Chemical Industry (2022SZ-TD005)
Quzhou Science and Technology Program (2021NC02)
Article Title: Remote plasma enhanced cyclic etching of a cyclosiloxane polymer thin film
Journal Title: International Journal of Extreme Manufacturing
Article Type: paper
Copyright Information: © 2024 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT
Publication dates
Date Received: 2024-02-29
Date Accepted: 2024-06-12
Online publication date: 2024-07-04