Fiedler, Johannes https://orcid.org/0000-0002-2179-0625
Palau, Adriá Salvador
Osestad, Eivind Kristen https://orcid.org/0009-0002-3332-0732
Parviainen, Pekka
Holst, Bodil https://orcid.org/0000-0001-6809-2579
Funding for this research was provided by:
H2020 Future and Emerging Technologies (863127)
H2020 Marie Skłodowska-Curie Actions (101031712)
Article Title: Realistic mask generation for matter-wave lithography via machine learning
Journal Title: Machine Learning: Science and Technology
Article Type: paper
Copyright Information: © 2023 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2022-10-10
Date Accepted: 2023-05-26
Online publication date: 2023-06-08