Camenzind, T N https://orcid.org/0000-0001-6326-5717
Elsayed, A
Mohiyaddin, F A
Li, R
Kubicek, S
Jussot, J
Van Dorpe, P
Govoreanu, B
Radu, I
Zumbühl, D M https://orcid.org/0000-0001-5831-633X
Funding for this research was provided by:
Swiss National Science Foundation (179024)
EU H2020 European Microkelvin Platform (EMP) Grant (No. 824109)
Swiss Nanoscience Institute
Swiss National Center of Competence in Research (NCCR) SPIN
Article Title: High mobility SiMOSFETs fabricated in a full 300 mm CMOS process
Journal Title: Materials for Quantum Technology
Article Type: paper
Copyright Information: © 2021 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2021-06-10
Date Accepted: 2021-12-07
Online publication date: 2021-12-27