Wang, Hao http://orcid.org/0000-0001-5388-6691
Pan, Cheng-Feng http://orcid.org/0009-0003-5103-7196
Li, Chi
Menghrajani, Kishan S
Schmidt, Markus A
Li, Aoling
Fan, Fu
Zhou, Yu
Zhang, Wang
Wang, Hongtao http://orcid.org/0000-0001-9736-2208
Nair, Parvathi Nair Suseela
Chan, John You En
Mori, Tomohiro http://orcid.org/0000-0001-7301-3986
Hu, Yueqiang
Hu, Guangwei
Maier, Stefan A
Ren, Haoran http://orcid.org/0000-0002-2885-875X
Duan, Huigao http://orcid.org/0000-0001-9144-2864
Yang, Joel K W http://orcid.org/0000-0003-3301-1040
Funding for this research was provided by:
Shenzhen Science and Technology Program (JCYJ20220530160405013)
Australian Research Council (DE220101085)
Natural Science Foundation of Hunan Province of China (2022JJ20020)
Deutsche Forschungsgemeinschaft (SCHM2655/15-1)
National Research Foundation Singapore (M21J9b0085)
Lee-Lucas Chair in Physics
National Natural Science Foundation of China (62275078)
Article Title: Two-photon polymerization lithography for imaging optics
Journal Title: International Journal of Extreme Manufacturing
Article Type: paper
Copyright Information: © 2024 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT
Publication dates
Date Received: 2023-11-01
Date Accepted: 2024-03-19
Online publication date: 2024-04-18