Mori, Y.
Yoshida, K.
Saito, K.
Miura, M.
Kanomata, K.
Ahmmad, B.
Kubota, S.
Hirose, F. https://orcid.org/0000-0001-9354-2850
Funding for this research was provided by:
Japan Society for the Promotion of Science (19H01884)
Core Research for Evolutional Science and Technology (JPMJCR14F3)
Research Institute of Electrical Communication, Tohoku University (H30/B07)
Article Title: Room-Temperature Atomic Layer Deposition of Aluminum Silicate and its Application to Na- and K-Ion Sorption
Journal Title: Journal of The Electrochemical Society
Article Type: paper
Copyright Information: © 2020 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-02-01
Date Accepted:
Online publication date: 2020-09-14