Funding for this research was provided by:
National Natural Science Foundation of China (52075318)
Article Title: Strong Chelating Agent Accelerated High Performance on Copper Polishing
Journal Title: Journal of The Electrochemical Society
Article Type: paper
Copyright Information: © 2025 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-09-25
Date Accepted:
Online publication date: 2025-02-13