Funding for this research was provided by:
Intel Corporation
Journal title: ECS Journal of Solid State Science and Technology
Article type: paper
Article title: Selective Polishing of Amorphous Silicon Carbonitride (a-SiCN) Films Over Silicon Dioxide and Silicon Nitride Films for Hardmask Applications
Copyright information: © 2020 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited
Publication dates
Date received: 2019-12-20
Online publication date: 2020-03-09