Funding for this research was provided by:
Intel Corporation
Article Title: Selective Polishing of Amorphous Silicon Carbonitride (a-SiCN) Films Over Silicon Dioxide and Silicon Nitride Films for Hardmask Applications
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2020 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-12-20
Date Accepted:
Online publication date: 2020-03-09