Mariscal, Juan Cristobal https://orcid.org/0000-0001-7956-6223
McAllister, Jeffrey
Sampurno, Yasa
Suarez, Jon Sierra
O’Neill, Mark
Zhou, Hongjun
Grief, Malcolm
Slutz, Dave
Philipossian, Ara
Article Title: Tribological, Thermal and Kinetic Characterization of SiO 2 and Si 3 N 4 Polishing for STI CMP on Blanket and Patterned Wafers
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2020 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-03-10
Date Accepted:
Online publication date: 2020-05-04