Sano, Yasuhisa https://orcid.org/0000-0002-1767-922X
Tajiri, Koki
Inoue, Yuki
Mukai, Risa
Nakanishi, Yuma
Matsuyama, Satoshi
Yamauchi, Kazuto
Article Title: High-Speed Etching of Silicon Carbide Wafer Using High-Pressure SF 6 Plasma
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2021 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-10-04
Date Accepted:
Online publication date: 2021-01-25