Jung, Chanwon
Song, Seokhwi
Lee, Namgue https://orcid.org/0000-0002-3774-9977
Kim, Youngjoon
Lee, Eun Jong
Lee, Sung Gwon
Jeon, Hyeongtag https://orcid.org/0000-0003-2502-7413
Funding for this research was provided by:
Ministry of Trade, Industry and Energy (20013569)
Samsung
Article Title: Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2021 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-01-13
Date Accepted:
Online publication date: 2021-04-20