Funding for this research was provided by:
Entegris, Inc. (Clarkson Project No 101429)
Article Title: Tribo-Electrochemistry of Post-CMP Cleaning: Results for Co and Cu Wafer Films Brushed in Different Solutions
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2021 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited
Publication dates
Date Received: 2021-02-20
Date Accepted: 2021-04-27
Online publication date: 2021-05-17