Funding for this research was provided by:
Entegris, Inc. (Clarkson Project No 101429)
Article Title: Tribo-Electrochemistry of Post-CMP Cleaning: Results for Co and Cu Wafer Films Brushed in Different Solutions
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2021 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-02-20
Date Accepted: 2021-04-27
Online publication date: 2021-05-17