Li, Yue https://orcid.org/0000-0002-9929-1244
Wang, Chenwei
Zhou, Jianwei https://orcid.org/0000-0002-2033-8864
Xu, Chen https://orcid.org/0000-0002-7183-8930
Cheng, Yuanshen https://orcid.org/0000-0002-5380-9474
Tian, Yuan https://orcid.org/0000-0003-2744-750X
Cui, Zhihui
Li, Hongliang
Liu, Qixu
Funding for this research was provided by:
Natural Science Foundation of Hebei Province (E2019202367)
National Natural Science Foundation of China (No.62074049)
Article Title: Role of Slurry Additives on Chemical Mechanical Planarization of Silicon Dioxide Film in Colloidal Silica Based Slurry
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2021 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited
Publication dates
Date Received: 2021-10-04
Date Accepted:
Online publication date: 2021-12-09