Jung, Chanwon
Song, Seokhwi
Kim, Jisoo
Park, Suhyeon
Kim, Byunguk
Kim, Kyunghoo
Jeon, Hyeongtag https://orcid.org/0000-0003-2502-7413
Funding for this research was provided by:
Ministry of Trade, Industry and Energy (20013569)
Article Title: Effect of Hydrogen Plasma Treatment on Atomic Layer Deposited Silicon Nitride Film
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2022 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2022-03-30
Date Accepted: 2022-06-06
Online publication date: 2022-06-20