Li, Hui-Hsuan https://orcid.org/0000-0002-0021-977X
Chen, Shang-Chiun
Lin, Yu-Hsien
Chien, Chao-Hsin
Article Title: Tunable EOT Scaling Down to 0.55 nm for HfO2-Based Gate-Stacks on Ge Substrate by In Situ H2 Plasma Treatment
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2024 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited
Publication dates
Date Received: 2023-12-27
Date Accepted:
Online publication date: 2024-05-06