Jani, Charmy https://orcid.org/0000-0002-7135-1153
Venkataswamy, Ravitej https://orcid.org/0009-0001-6094-309X
Seo, Jihoon https://orcid.org/0000-0003-3946-6476
Krishnan, Sitaraman https://orcid.org/0000-0002-1228-8393
Funding for this research was provided by:
FuzeHub
Center for Advanced Materials Processing, Clarkson University
Article Title: Revisiting the Roles of Chelator, Inhibitor, Oxidant, and Abrasive in High-Rate Copper CMP
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited
Publication dates
Date Received: 2025-01-29
Date Accepted:
Online publication date: 2025-04-09