Zhang, Ronghua
Wu, Zhenyu
Yin, Chao
Song, Zhitang
Hu, Xiaokai https://orcid.org/0000-0001-7048-6614
Liu, Weili
Funding for this research was provided by:
Guangxi Scheme for Overseas Recruitment of One Hundred Talents
Strategic Priority Research Program of the Chinese Academy of Sciences (Grant No. XDB0670000)
Article Title: Phosphorus Oxoacids Enhance Material Removal Rate in Chemical Mechanical Polishing of Silicon Nitride Films
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2025 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2025-03-17
Date Accepted:
Online publication date: 2025-06-20