Xia, Yongkang https://orcid.org/0009-0009-5108-9125
Nikor, Sk Shafaat Saud https://orcid.org/0000-0003-0217-7128
Gajowski, Nathan
Lee, Seunghyun
Muduli, Manisha
Noh, Siyun
Nallamothu, Naga Swetha
Adams, Rachel L. https://orcid.org/0009-0004-3329-8816
Reano, Ronald M.
Ringel, Steven A.
Krishna, Sanjay
Arafin, Shamsul https://orcid.org/0000-0003-4689-2625
Funding for this research was provided by:
Intel’s Center for Advanced Semiconductor Fabrication Research and Education (GR129846)
Division of Electrical, Communications and Cyber Systems (2144375)
Article Title: Dual-Sacrificial-Layer Wet Etching for Transfer Printing of InP-Based Antimony-Containing Materials
Journal Title: ECS Journal of Solid State Science and Technology
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited
Publication dates
Date Received: 2025-07-16
Date Accepted:
Online publication date: 2025-10-15