Shin, Hyunsu
Lee, Juhee
Lee, Minhyung https://orcid.org/0000-0001-6322-5897
Ryu, Hwa-Yeon
Park, Seran
Park, Heungsoo
Ko, Dae-Hong
Article Title: Recrystallization and activation of ultra-high-dose phosphorus-implanted silicon using multi-pulse nanosecond laser annealing
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2020 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-10-01
Date Accepted: 2020-01-09
Online publication date: 2020-02-20