Chen, Xiaoyu https://orcid.org/0000-0002-6162-7806
Shan, Guangbao https://orcid.org/0000-0002-9268-4870
Article Title: Eliminating WSi x peeling in a polycide process by an amorphization technique of ion implantation
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2020 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-10-31
Date Accepted: 2020-02-03
Online publication date: 2020-03-30