Kodama, Y. https://orcid.org/0000-0002-7459-7984
Zaizen, Y.
Minari, H.
Cho, Y.
Fukasawa, M. https://orcid.org/0000-0002-9011-8293
Kugimiya, K.
Nagaoka, K.
Iwamoto, H.
Article Title: Diffusion mechanism of fluorine in plasma processing of III–V semiconductor compounds
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2020 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-01-10
Date Accepted: 2020-03-24
Online publication date: 2020-04-13