Im, Dong-Hyeok https://orcid.org/0000-0003-1421-3421
Min, Woo-Sig https://orcid.org/0000-0002-3315-4175
Hong, Sang-Jeen https://orcid.org/0000-0002-6576-690X
Article Title: Planar heating chuck to improve temperature uniformity of plasma processing equipment
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2020 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-11-17
Date Accepted: 2020-03-27
Online publication date: 2020-04-21