Imamura, Tsubasa
Sakai, Itsuko
Hayashi, Hisataka
Sekine, Makoto
Hori, Masaru
Article Title: Cyclic C 4 F 8 and O 2 plasma etching of TiO 2 for high-aspect-ratio three-dimensional devices
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2020-11-19
Date Accepted: 2021-01-25
Online publication date: 2021-02-12